CATS™ is the most advanced and full featured mask data preparation (MDP) software available for semiconductor photomask manufacturing.

A powerful, hierarchical layout visualization and analysis tool, which allows viewing and editing GDSII and OASIS layouts from small IP blocks to full chip databases.

IC WorkBench Plus is a powerful, hierarchical layout visualization and analysis tool.

Proteus provides a comprehensive and powerful environment for performing full-chip proximity correction, building models for correction, and analyzing proximity effects on corrected and uncorrected IC layout patterns.

Proteus LRC is Synopsys' next generation OPC verification tool enabling fast and accurate hotspot detection across the process window for full-chip mask validation within the Proteus Pipeline Technology.

Proteus MetroKit is a toolset designed to facilitate and automate the process of interfacing with metrology tools, thereby minimizing tool downtime and maximizing engineering efficiency.

Proteus WorkBench provides a single tool environment that facilitates building models, tuning correction recipes for full-chip OPC, and analyzing proximity effects on corrected and uncorrected IC layout patterns.

Alt-PSM technology for tighter control of chip performance and increased yield.

Sentaurus Lithography process window analyzer (PWA) is a comprehensive and powerful tool for visualizing and analyzing simulation results or experimental data, for example, obtained by critical dimension (CD) metrology measurements.

Sentaurus Lithography represents advanced modeling for semiconductor device manufacturing process development and optimization, covering a wide-range of applications in optical, immersion, EUV, and e-beam lithography.

Design-centric yield management for product engineering